Abstract:

The Central Fabrication Laboratory (CFL) is a cutting-edge cleanroom facility located at the University of Hong Kong. Its primary mission is to provide advanced fabrication facilities and expertise to enhance teaching and research activities in micro/nano fabrication. As a leading research laboratory, CFL offers open access not only to University of Hong Kong members but also to local and international institutions, researchers, and companies, with collaborations from the private sector always encouraged. The technical sharing sessions offered by CFL are designed to keep participants updated on the latest micro/nano fabrication techniques and provide valuable networking opportunities with experts from around the world.

Electron Beam Lithography (EBL) is a highly versatile and precise technique for fabricating nano-scale structures. Modern advancements have led to the development of sophisticated EBL systems designed for innovators pushing the boundaries of ultra-fine patterning. These state-of-the-art systems feature a large writing area of up to 300mm square, accommodating a wide range of substrates—from small samples to full 300mm wafers and 9-inch masks. They offer a selection of acceleration voltages, including 50, 100, 125, and 150KV, enabling high-resolution patterning with excellent control. This seminar will introduce the latest EBL systems, exploring their core working principles and highlighting capabilities for achieving lithography processes at 125KV or higher acceleration voltages.

Biography:

Dr. Feifei Yuna received her PhD degree from the Department of Physis at Southeast University in 2017. In 2020, she joined Elionix China as an EBL application engineer.